Phansco developed the oblique angle deposition method which is well-known as physical vapor deposition (PVD) technology. It can manufacture high-efficiency SERS substrates.The patent of the process technology has been applied in Taiwan, the United States and China.The process is then often conducted at highly oblique deposition angles and usually called Glancing Angle Deposition (GLAD). The pores of the metal film are mainly caused by the special physical structure of the substrate carrier, which is called the self-shielding effect.
Front end process-coating : Electron beam evaporation
In an ultra-high vacuum environment, the material is heated by resistance or electron beams to reach the melting temperature, so that it is melted and then vaporized. At this time, the atoms or molecules of gaseous thin film material have the kinetic energy after heating. They reach and adhere to the substrate. That is a coating technique on the surface of a substrate.